In situ diagnosis of plasma environment for synthesizing diamond film was conducted by langmuir single probe and optical emission spectroscopy . the mechanism of diamond growth was investigated and the n - type diamond was deposited by glow plasma assisted chemical vapor deposition ( cvd ) 本文通过langmuir单探针和光发射谱对合成金刚石薄膜的等离子体环境进行了原位诊断；初步探讨了金刚石薄膜生长的动力学过程；并采用辉光等离子体辅助化学气相沉积( cvd )技术制备得到了n型金刚石薄膜。
